Chi-CCZK-SF magnetron sputtering machine, with a high deposition rate, the substrate temperature is low, the adhesion of the film, and can achieve a large area coating with respect to the conventional evaporation coating equipment, Chi-magnetron sputtering can get more excellent film density, uniformity and cohesion using the most advanced DC or MF magnetron sputtering power supply to meet the needs of different levels.
Advanced high-speed low-temperature sputtering technology, greatly expanded the scope of application of Chi-CCZK-SF magnetic devices that can not heat or heat of the products provide quality solutions sputtering using Chi-innovation process, excellence, The EU adopted a comprehensive CE and ISO international quality management system certification;
High decorative film for plating, alloy layer and the like. Advanced high-speed response low-temperature sputtering technology, the success of its high-speed growth capacity and excellent film uniformity of the film density, widely used in plastic cutlery, cell phone case, sanitary ware, car wheels, metal jewelry and signs, and other coatings. Also sputtered plastic products, ceramics, mosaics, resin, crystal glass products.
CCZK-SF magnetron sputtering equipment
Cavity structure: vertical front door, the front door horizontal.
Material material: cavity made of SUS304 stainless steel or carbon steel
Vacuum system: diffusion pump (optional molecular pump) + roots pump mechanical pump + maintain pump (otherwise cryogenic pump systems to choose from)
Sputtering targets: central cylindrical target, planar target, target, etc. twin
Magnetron power: it can be equipped with a DC or MF magnetron sputtering power
Rotation system: frequency control, combined rotation and revolution, according to customer requirements for product and design
Film structure: single-layer film, multilayer film
Gas control: Gas flow control device integrated touch operation control
HMI: PLC intelligent control + full-color touch screen HMI
Operating mode: logic of automatic mode, semi-automatic mode, manual mode
Intelligent Control: PLC intelligent control + HMI full-color touch human-machine interface, to achieve automatic control
Alarm and protection: abnormal situation alarm, and implement the appropriate protective measures.
Other technical parameters:
Ultimate vacuum: 5.0 × 10-4Pa
Pumping speed: 5.0 * 10-2≤5min
Hydraulic flow rate ≥0.2Mpa 3m3 / h; temperature ≤25 ℃; Pressure: 0.4-0.8Mpa;
Φ1000mm * H1200mm, Φ1400mm * H1600mm, Φ1200mm * H1500mm,
Φ1800mm * H2000mm, Φ2000mm * H2200mm
Vacuum chamber size or device configurations according to customer requirements for customized products and special process.